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Fig. 2. Cephalometric landmarks used for measurements.14 n, Nasion; s, sella; cd, condylion; ba, basion; ar, articulare; gn, gnathion; pg, pogonion; sm, supramentale; isi, incisal superior incisor; iii, incisal inferior incisor; ss, subspinale; sp, spinale; MBLar, mandibular base line; Rlar, ramus line; ILi, incisal line inferior; ILs, incisal line superior; ML, mandibular line; NL, nasal line.
Korean J Orthod 2020;50:170~180 https://doi.org/10.4041/kjod.2020.50.3.170
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